The results analyzed in those obtained by inductively coupled plasma - atomic emission spectroscopy and atomic absorption spectroscopy.

本文分析结果与等离子发射光谱和原子吸收光谱对照相吻合.

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Methods: The copper content was determined by atomic absorption spectrophotometry ( AAS ) and inductively coupled plasma atomic emission spectrometry ( ICP - AES ).

方法采用原子吸收分光光度法 ( AAS ),电感耦合等离子体原子发射光谱法 ( ICP -AES ) 分别测定铜含量.

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Inductively coupled plasma was first used to dry etch of InSb thin film.

应用感应耦合等离子体技术首次实现了对锑化铟薄膜的干法刻蚀.

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