The rooting effect of the structure in deep reactive ion etching ( DRIE ) process was investigated.

给出了加速度计的制作工艺流程,研究了解决深 反应离子刻蚀 过程中的过刻蚀现象的方法.

互联网

The theory of ion etching and the parameter of ion source designing are discussed in detail.

并且详细论述离子刻蚀的原理以及离子源的参数设计.

互联网

The experiment of fully automatic reactive ion etching on 3 inch GaAs wafer is described.

介绍了全自动反应离子腐蚀3英寸GaAs片的实验研究工作.

互联网

The waveguide device was fabricated by - coating films , using aluminum as mask and oxygen reactive ion etching.

我们采用旋涂 、 铝掩膜和氧反应离子刻蚀的方法(RIE)制得了聚合物阵列式光波导器件.

互联网