Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.
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The kinetic process of reactive magnetron sputtering has been studied.
研究了反应磁控溅射的动力学过程.
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Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .
采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.
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Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜.
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Methods: The nature HA films were prepared by electron beam evaporation and rf - magnetron sputtering techniques.
方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.
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The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.
利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.
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In the fourth chapter Sb - doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.
第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.
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Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.
采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.
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The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性.
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Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering.
摘要采用射频磁控溅射技术在改性氟塑料表面沉积铝层,制备了金属/氟化高聚物复合薄膜.
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Y - doped zinc oxide ( ZYO ) thin films frequency alternative magnetron sputtering on glass substrates with ZYO ceramic targets.
利用中频磁控溅射法,溅射氧化锌钇 ( ZYO ) 陶瓷靶材,在玻璃基底上制备ZYO透明导电薄膜.
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Metal aluminum films were deposited on AAO templates by radio frequency magnetron sputtering.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜.
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TiB _ 2 and Ti - B - N coatings were prepared by magnetron sputtering on 1 Cr 18 Ni 9 Ti stainless steel.
用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和 Ti -B-N涂层.
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Nanocrystallized 309 stainless steel coating has been fabricated on glass substrate by DC magnetron sputtering.
用动电位极化、恒电位极化及交流阻抗技术研究了309不锈钢及其溅射纳米涂层在0.
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A new type closed field - unbalanced magnetron sputtering technology for optical coatings is described.
介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术.
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