An experimental double - beam and double - exposure interference photolithographic system has been established.

建立了双光束双曝光干涉光刻实验系统.

互联网

These filters can be fabricated by photolithographic or electro - deposition techniques with high accuracy and repeatability.

这种滤波器能通过电铸方法制造,具有准确性和可重复性.

互联网

Photolithographic patterning and thin film deposition were used for manufacturing multilevel diffractive optical element ( DOE ) .

应用光刻和薄膜沉积技术,制作了多级衍射 光学元件.

互联网