In this study, the strategy of ESD protection development in deep submicron process will be investigated.
本篇论文主要的目的是研究在深亚微米技术下的ESD防护设计策略.
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A resistance macromodel for deep - submicron process epi - type substrate based on the 2 D device simulation is presented.
摘要提出了一种基于二维器件模拟的深亚微米工艺外延型衬底的电阻宏模型.
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