A novel in - situ non - flatness measurement method of wafer chuck in step - and - scan projection lithographic tool is presented.

提出一种步进扫描投影 光刻机 承片台不平度检测新技术.

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A novel in - situ non - flatness measurement method wafer chuck in step - and - scan projection lithographic tool is presented.

提出一种新的步进扫描投影光刻机工件台方镜不平度测量方法.

互联网