Hot cathode chemical vapor deposition method was established in order to deposit high - quality diamond films highrate.

为快速沉积高品质金刚石膜,建立了热阴极等离子体化学气相沉积方法.

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Nano - sized silicon films with large area were prepared by normal Low Pressure Chemical Vapor Deposition method.

利用普通低压化学气相沉积技术在玻璃衬底上制备了大面积的纳米硅薄膜.

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